Shadow masks define device areas and form micro-structures with precision by masking or covering the target surface. Patterning a silicon wafer or substrate is usually processed with deposition using a photomask or direct-write lithography.
Shadow masks manufactured by Micron Laser Technologies are a rapid and cost effective alternative over photolithography when feature sizes are no smaller than 25um.
Laser fabricated geometries achieve smaller dimensions, sharper edges, and tighter tolerances than chemical etching. Shadow masks can be fabricated from unconventional materials that eliminate possible chemical contamination or reactions.
Laser fabricated limitations include:
— Maximum process tolerance is ± 10μm, application dependent.
— Minimum width of patterns is 20μm.
Mechanical supports or carrier frames can be fabricated to assist in handling and aligning shadow-masks to target device features.
Shadow Masks Can Be Found In:
- OTFTs (electrodes)
- Photovoltaics (solar cells)
- User Defined Masks
- MEMS Devices
- Alignment Targets
- Encoder Disks
- Biomedical Devices
- Optical Devices
CAD or Data Requirements For Shadow Mask Fabrication
CAD system integration and custom file converters enable flexible, laser manufacturing from customer-provided data. Although most file types are accepted, the preferred file types are Gerber, DXF, or other 2D formats.
For more CAM/CAD guidelines and detailed requirements, click CAD Requirements.